Please use this identifier to cite or link to this item: https://doi.org/10.1002/pi.1713
Title: Synthesis and characterization of novel multifunctional poly(methyl methacrylate)s as potential fluorescent labels for electron-beam lithography
Authors: Liao, S.
Soo, C.P.
Ye, H.
Valiyaveettil, S. 
Keywords: E-beam resist
Fluorescent label
Fluorophore
PMMA
Issue Date: Apr-2005
Citation: Liao, S., Soo, C.P., Ye, H., Valiyaveettil, S. (2005-04). Synthesis and characterization of novel multifunctional poly(methyl methacrylate)s as potential fluorescent labels for electron-beam lithography. Polymer International 54 (4) : 622-628. ScholarBank@NUS Repository. https://doi.org/10.1002/pi.1713
Abstract: A series of novel fluorophore-rich polymers has been synthesized with the aim of developing radiation-sensitive materials as electron-beam resists. The polymers were characterized using FTIR and NMR spectroscopy, and gel permeation chromatography, differential scanning calorimetry and thermogravimetric analysis measurements. These polymers showed strong absorbance in the region of 330-380 nm, and can be patterned by an electron-beam in their pure form or mixed with other components. All polymers also generated intense emission in the range 510-565 nm when irradiated by a laser source operating at a wavelength of 488 nm. The sensitivity of the polymeric fluorescence label as an electron-beam resist was also discussed. Moreover, through immobilization of the fluorophores onto a polymer backbone, we managed to avoid the crystallization of fluorophores inside the polymer film. © 2005 Society of Chemical Industry.
Source Title: Polymer International
URI: http://scholarbank.nus.edu.sg/handle/10635/77140
ISSN: 09598103
DOI: 10.1002/pi.1713
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