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https://scholarbank.nus.edu.sg/handle/10635/74713
DC Field | Value | |
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dc.title | Phosphorus implant for S/D extension formation: Diffusion and activation study after spacer and spike anneal | |
dc.contributor.author | Yeong, S.H. | |
dc.contributor.author | Colombeau, B. | |
dc.contributor.author | Benistant, F. | |
dc.contributor.author | Srinivasan, M.P. | |
dc.contributor.author | Mulcahy, C.P.A. | |
dc.contributor.author | Lee, P.S. | |
dc.contributor.author | Chan, L. | |
dc.date.accessioned | 2014-06-19T06:15:35Z | |
dc.date.available | 2014-06-19T06:15:35Z | |
dc.date.issued | 2006 | |
dc.identifier.citation | Yeong, S.H.,Colombeau, B.,Benistant, F.,Srinivasan, M.P.,Mulcahy, C.P.A.,Lee, P.S.,Chan, L. (2006). Phosphorus implant for S/D extension formation: Diffusion and activation study after spacer and spike anneal. AIP Conference Proceedings 866 : 58-61. ScholarBank@NUS Repository. | |
dc.identifier.isbn | 0735403651 | |
dc.identifier.issn | 0094243X | |
dc.identifier.uri | http://scholarbank.nus.edu.sg/handle/10635/74713 | |
dc.description.abstract | Formation of highly activated S/D extension is one of the key issues to meet the requirements for further downscaling of CMOS devices. Germanium-preamorphization implant (Ge-PAI) followed by solid phase epitaxial regrowth (SPER) is capable of forming abrupt and shallow junctions with activation levels well above solid solubility. In this paper, we demonstrate a possible alternative by using phosphorus (P) with the Ge-PAI and boron (B) Halo implant to form the S/D extension of NMOS. The anomalous diffusion and activation of P after the conventional spacer and spike anneals were studied. We observed that a highly activated and shallow junction can be formed via Ge-PAI after spacer anneal which is equivalent to a low temperature SPER. The level of P activation is enhanced even more when B Halo is considered. It is postulated that this is due to the competing interactions of B and P with the emitted interstitials of the end-of-range (EOR) defects. However, improvement in junction depth and electrical properties due to B halo implant decreases when annealing temperature increases. © 2006 American Institute of Physics. | |
dc.source | Scopus | |
dc.subject | Ge-pai | |
dc.subject | Halo implant | |
dc.subject | Phosphorus | |
dc.subject | Spacer anneal | |
dc.subject | SPER | |
dc.subject | Spike anneal | |
dc.type | Conference Paper | |
dc.contributor.department | CHEMICAL & BIOMOLECULAR ENGINEERING | |
dc.description.sourcetitle | AIP Conference Proceedings | |
dc.description.volume | 866 | |
dc.description.page | 58-61 | |
dc.identifier.isiut | NOT_IN_WOS | |
Appears in Collections: | Staff Publications |
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