Please use this identifier to cite or link to this item: https://doi.org/10.1109/SMICND.2005.1558739
Title: Optimization of spray coating photoresist for high topography surfaces
Authors: Lee, Y.Y.
Yu, L. 
Tay, F.E.H. 
Iliescu, C.
Keywords: High topography surface
Photoresist
Spray coating
Issue Date: 2005
Source: Lee, Y.Y.,Yu, L.,Tay, F.E.H.,Iliescu, C. (2005). Optimization of spray coating photoresist for high topography surfaces. Proceedings of the International Semiconductor Conference, CAS 1 : -. ScholarBank@NUS Repository. https://doi.org/10.1109/SMICND.2005.1558739
Abstract: In this paper, we present a practical optimization approach for photoresist mix and a reliable method to qualify the photoresist coated, not only on the planar surface, but also at the edges and side of slopes within the trenches. By observing the cross sectional profile of the trenches, the spray coater machine and photoresist compositions are optimized to produce a desirable cross-sectional profile, especially for sidewall. Information regarding the uniformity of the photoresist coated along the sidewalls and limitations of the proposed technique are discussed. After optimization, good coverage and uniformity of photoresist are achieved not only on planar surface, but also in sidewall of trenches. © 2005 IEEE.
Source Title: Proceedings of the International Semiconductor Conference, CAS
URI: http://scholarbank.nus.edu.sg/handle/10635/73731
ISBN: 0780392140
DOI: 10.1109/SMICND.2005.1558739
Appears in Collections:Staff Publications

Show full item record
Files in This Item:
There are no files associated with this item.

SCOPUSTM   
Citations

5
checked on Dec 5, 2017

Page view(s)

14
checked on Dec 9, 2017

Google ScholarTM

Check

Altmetric


Items in DSpace are protected by copyright, with all rights reserved, unless otherwise indicated.