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|Title:||Micromachined III-V multimorph actuator model and design using Simulated Annealing (SA)-based global optimization|
Simulated Annealing (SA)
|Citation:||Ongkodjojo, A.,Tay, F.E.H.,Akkipeddi, R. (2004). Micromachined III-V multimorph actuator model and design using Simulated Annealing (SA)-based global optimization. 2004 NSTI Nanotechnology Conference and Trade Show - NSTI Nanotech 2004 1 : 374-377. ScholarBank@NUS Repository.|
|Abstract:||A new AlAs/GaAs-based multimorph microactuator is designed and modeled for micro-opto-electro-mechanical systems (MOEMS) applications with photonic devices. As the piezoelectric-based III-V materials such as AlAs/GaAs have small piezoelectric constants, we have developed the Simulated Annealing (SA)-based global optmization to obtain the optimum solution for the structure with a high sensitivity. This proposed optimization method can efficiently lead the design for achieving the highest sensitivity as the structure materials can be grown epitaxially with a minimum thickness of 10 nm for each layer. Therefore, the smallest thickness of the structure layers and its highest sensitivity can easily be achieved by using the optimization method. In addition, for more realistic design and model, we develop the constraint optimization method using the SA algorithm, which can satisfy the specified constraints.|
|Source Title:||2004 NSTI Nanotechnology Conference and Trade Show - NSTI Nanotech 2004|
|Appears in Collections:||Staff Publications|
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