Please use this identifier to cite or link to this item: http://scholarbank.nus.edu.sg/handle/10635/73570
Title: Laser dicing of silicon wafer
Authors: Tang, Y. 
Fuh, J.Y.H. 
Loh, H.T. 
Wong, Y.S. 
Lim, Y.K.
Keywords: laser dicing
Laser materials processing
semiconductor
silicon wafer
Issue Date: Feb-2008
Source: Tang, Y.,Fuh, J.Y.H.,Loh, H.T.,Wong, Y.S.,Lim, Y.K. (2008-02). Laser dicing of silicon wafer. Surface Review and Letters 15 (1-2) : 153-159. ScholarBank@NUS Repository.
Abstract: The effect of various laser processing parameters on the kerf width and cut quality of Si wafer as well as encapsulated Si wafer is investigated. The parameters are then optimized to minimize the heat affect zone and obtain the best possible cut quality. It has been found that oxygen is the most suitable assist gas for laser dicing and that the highest gas pressure may not produce the best cut quality. The effect of laser repetition rate, pump energy, feed rate, and number of passes are also studied. Under optimized parameters, the cut quality of Si wafer using laser dicing is found to be comparable to diamond saw dicing. © 2008 World Scientific Publishing Company.
Source Title: Surface Review and Letters
URI: http://scholarbank.nus.edu.sg/handle/10635/73570
ISSN: 0218625X
Appears in Collections:Staff Publications

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