Please use this identifier to cite or link to this item: https://doi.org/10.1117/12.456841
Title: The fabrication of TiNi thin films by pulsed-laser deposition
Authors: Chen, X.
Lu, Y. 
Ren, Z.
Zhu, S.
Keywords: Laser ablation
PLD
Shape memory alloy
Thin film
TiNi
Issue Date: 2002
Citation: Chen, X., Lu, Y., Ren, Z., Zhu, S. (2002). The fabrication of TiNi thin films by pulsed-laser deposition. Proceedings of SPIE - The International Society for Optical Engineering 4426 : 225-228. ScholarBank@NUS Repository. https://doi.org/10.1117/12.456841
Abstract: TiNi shape memory alloy (SMA) thin films have been fabricated by pulsed-laser deposition (PLD) at different substrate temperatures. The stoichiometry, surface morphology and crystallinity of the films were characterized by X-ray photoelectron spectroscopy (XPS), atomic force microscope (AFM) and X-ray diffraction (XRD). The transformation behaviour and crystallization temperatures were investigated by differential scanning calorimetry (DSC). It is found that the Ni content of the deposited films ranges from 46.7 to 52.0 at.%. The films deposited at low temperature are amorphous. The crystallization temperature of the Ti-51.5 at.% Ni thin film is 449°C. The martensitic transformation temperature of the film is -20.8°C.
Source Title: Proceedings of SPIE - The International Society for Optical Engineering
URI: http://scholarbank.nus.edu.sg/handle/10635/71978
ISSN: 0277786X
DOI: 10.1117/12.456841
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