Please use this identifier to cite or link to this item: https://doi.org/10.1116/1.1481865
Title: Sub-50 nm nanopatterning of metallic layers by green pulsed laser combined with atomic force microscopy
Authors: Huang, S.M.
Hong, M.H. 
Luk'yanchuk, B.S.
Lu, Y.F. 
Song, W.D. 
Chong, T.C. 
Issue Date: May-2002
Source: Huang, S.M., Hong, M.H., Luk'yanchuk, B.S., Lu, Y.F., Song, W.D., Chong, T.C. (2002-05). Sub-50 nm nanopatterning of metallic layers by green pulsed laser combined with atomic force microscopy. Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures 20 (3) : 1118-1125. ScholarBank@NUS Repository. https://doi.org/10.1116/1.1481865
Abstract: Pulsed-laser assisted nanopatterning of metallic layers on silicon substrates was investigated under an atomic force microscope (AFM) tip. A 532 nm Nd:YAG laser with pulse duration of 7 ns and boron doped silicon tip was used. Nanopatterns like pit arrays and multilines were created with lateral dimensions between 10 and 15 nm and depths between 2.5 and 21 nm. The field enhancement factor under the tip, thermal expansion of the tip and the sample surface heating were investigated. It was proposed that the field enhancement mechanism was the dominating reason for the nanoprocessing.
Source Title: Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
URI: http://scholarbank.nus.edu.sg/handle/10635/71892
ISSN: 10711023
DOI: 10.1116/1.1481865
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