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Title: Robust real-time thin film thickness estimation
Authors: Kiew, C.M.
Tay, A. 
Ho, W.K. 
Lim, K.W. 
Lee, J.H.
Keywords: Film thickness estimation
Optical spectrometry
Photoresist development
Semiconductor manufacturing
Issue Date: 2006
Source: Kiew, C.M.,Tay, A.,Ho, W.K.,Lim, K.W.,Lee, J.H. (2006). Robust real-time thin film thickness estimation. ASMC (Advanced Semiconductor Manufacturing Conference) Proceedings 2006 : 57-62. ScholarBank@NUS Repository.
Abstract: The dissolution of photoresist in developer solution often leads to changes in the chemical composite of the solution which hinder film thickness estimation. This paper addresses this issue by proposing a modified Fringe Order Computation (MFOC) method which analyses reflected light intensity data acquired using commercially available optical spectrometry system. MFOC uses simple arithmetic operations and is capable of computing film thickness at real-time. It is more reliable as compared to other methods during develop step in microlithography process. © 2006 IEEE.
Source Title: ASMC (Advanced Semiconductor Manufacturing Conference) Proceedings
ISBN: 1424402549
ISSN: 10788743
DOI: 10.1109/ASMC.2006.1638724
Appears in Collections:Staff Publications

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