Please use this identifier to cite or link to this item: https://doi.org/10.1109/ASMC.2006.1638724
Title: Robust real-time thin film thickness estimation
Authors: Kiew, C.M.
Tay, A. 
Ho, W.K. 
Lim, K.W. 
Lee, J.H.
Keywords: Film thickness estimation
Microlithography
Optical spectrometry
Photoresist development
Semiconductor manufacturing
Issue Date: 2006
Source: Kiew, C.M.,Tay, A.,Ho, W.K.,Lim, K.W.,Lee, J.H. (2006). Robust real-time thin film thickness estimation. ASMC (Advanced Semiconductor Manufacturing Conference) Proceedings 2006 : 57-62. ScholarBank@NUS Repository. https://doi.org/10.1109/ASMC.2006.1638724
Abstract: The dissolution of photoresist in developer solution often leads to changes in the chemical composite of the solution which hinder film thickness estimation. This paper addresses this issue by proposing a modified Fringe Order Computation (MFOC) method which analyses reflected light intensity data acquired using commercially available optical spectrometry system. MFOC uses simple arithmetic operations and is capable of computing film thickness at real-time. It is more reliable as compared to other methods during develop step in microlithography process. © 2006 IEEE.
Source Title: ASMC (Advanced Semiconductor Manufacturing Conference) Proceedings
URI: http://scholarbank.nus.edu.sg/handle/10635/71688
ISBN: 1424402549
ISSN: 10788743
DOI: 10.1109/ASMC.2006.1638724
Appears in Collections:Staff Publications

Show full item record
Files in This Item:
There are no files associated with this item.

SCOPUSTM   
Citations

1
checked on Feb 12, 2018

Page view(s)

29
checked on Feb 16, 2018

Google ScholarTM

Check

Altmetric


Items in DSpace are protected by copyright, with all rights reserved, unless otherwise indicated.