Please use this identifier to cite or link to this item:
|Title:||Monitoring and control of photoresist properties and CD during photoresist processing|
|Source:||Yang, G., Ngo, Y.-S., Putra, A.S., Ang, K.-T., Tay, A., Fang, Z.-P. (2010). Monitoring and control of photoresist properties and CD during photoresist processing. Proceedings of SPIE - The International Society for Optical Engineering 7638 : -. ScholarBank@NUS Repository. https://doi.org/10.1117/12.846560|
|Abstract:||Current approaches to control critical dimensions (CD) uniformity during lithography is primarily based on run-to- run (R2R) methods where the CD is measured at the end of the process and correction is done on the next wafer (or batch of wafers) by adjusting the parameter set-points. In this work, we proposed a method to monitor the various photoresist parameters (e.g. photoresist thickness, photoactive compound) and CD in-situ and in real-time. Through modeling and real-time identification, we develop new in-situ measurement techniques for the various parameters of interest in the lithography sequence using existing available data in the manufacturing process. © 2010 Copyright SPIE - The International Society for Optical Engineering.|
|Source Title:||Proceedings of SPIE - The International Society for Optical Engineering|
|Appears in Collections:||Staff Publications|
Show full item record
Files in This Item:
There are no files associated with this item.
checked on Dec 10, 2017
Items in DSpace are protected by copyright, with all rights reserved, unless otherwise indicated.