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|Title:||Modeling study of InSb thin film for advanced III-V MOSFET applications|
|Citation:||Zhu, Z.G.,Low, T.,Li, M.F.,Fan, W.J.,Bai, P.,Kwong, D.L.,Samudra, G. (2006). Modeling study of InSb thin film for advanced III-V MOSFET applications. Technical Digest - International Electron Devices Meeting, IEDM : -. ScholarBank@NUS Repository. https://doi.org/10.1109/IEDM.2006.346736|
|Abstract:||Band structure of III-V material InSb thin films is calculated using empirical pseudopotential method (EPM). Contrary to the predictions by simple effective mass methods, our calculation predicts that the Γ valley (with the smallest isotropic bulk effective mass) in InSb remains the lowest lying conduction valley despite size quantization effects in the presence of competing L and Δ valleys which have larger quantization mass. Based on EPM, we computed the important electronic parameters (effective mass, valley minima) of InSb thin film as a function of film thicknesses. Our calculations reveal that the 'effective mass ' of Γ valley electrons increases with the scaling down of film thickness. We then studied the transport of InSb thin film using Non-Equilibrium Green's Function. The calculation reveals that InSb is comparable but not superior to Si as channel material of ultra-thin body double gate n-MOSFET in the ballistic limit of these devices.|
|Source Title:||Technical Digest - International Electron Devices Meeting, IEDM|
|Appears in Collections:||Staff Publications|
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