Please use this identifier to cite or link to this item: https://doi.org/10.1117/12.847879
Title: In-situ monitoring and control of photoresist parameters during thermal processing in the lithography sequence
Authors: Wu, X.
Yang, G.
Lim, E.-X.
Tay, A. 
Keywords: Photoresist processing
Real-time control
Temperature control
Issue Date: 2009
Source: Wu, X.,Yang, G.,Lim, E.-X.,Tay, A. (2009). In-situ monitoring and control of photoresist parameters during thermal processing in the lithography sequence. Proceedings of SPIE - The International Society for Optical Engineering 7520 : -. ScholarBank@NUS Repository. https://doi.org/10.1117/12.847879
Abstract: The rapid transition to smaller microelectronic feature sizes involves the introduction of new lithography technologies, new photoresist materials, and tighter processes specifications. This transition has become increasingly difficult and costly. The application of advanced computational and control methodologies have seen increasing utilization in recent years to improve yields, throughput, and, in some cases, to enable the actual process to print smaller devices. In this work, we demonstrate recent advances in real-time monitoring and control of these photoresist parameters with the use of innovative technologies, control and signal processing techniques; and integrated metrology to improve the performance of the various photoresist processing steps in the lithography sequence. © 2009 Copyright SPIE - The International Society for Optical Engineering.
Source Title: Proceedings of SPIE - The International Society for Optical Engineering
URI: http://scholarbank.nus.edu.sg/handle/10635/70610
ISBN: 9780819479099
ISSN: 0277786X
DOI: 10.1117/12.847879
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