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Please use this identifier to cite or link to this item: https://scholarbank.nus.edu.sg/handle/10635/70279
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dc.titleFabrication of magnetic nanostructures using KrF lithography
dc.contributor.authorSingh, N.
dc.contributor.authorGoolaup, S.
dc.contributor.authorAdeyeye, A.O.
dc.date.accessioned2014-06-19T03:10:18Z
dc.date.available2014-06-19T03:10:18Z
dc.date.issued2004
dc.identifier.citationSingh, N.,Goolaup, S.,Adeyeye, A.O. (2004). Fabrication of magnetic nanostructures using KrF lithography. 2004 4th IEEE Conference on Nanotechnology : 65-67. ScholarBank@NUS Repository.
dc.identifier.isbn0780385365
dc.identifier.urihttp://scholarbank.nus.edu.sg/handle/10635/70279
dc.description.abstractWe have developed a large area nanofabrication technique for synthesizing nanomagnetic arrays based on KrF lithographic exposure tool. Using phase shift mask technique and resist trimming, we have fabricated array of complex nanomagnetic structures with dimensions well below the resolution limit of conventional optical lithography. Magnetic nanostructures of different shapes, complexities and sizes down to 50nm displaying novel properties have been fabricated using lift off method. © 2004 IEEE.
dc.sourceScopus
dc.subjectLift-off
dc.subjectLithography
dc.subjectMagnetic nanostructures
dc.subjectNanofabrication
dc.subjectPhase shift mask
dc.typeConference Paper
dc.contributor.departmentELECTRICAL & COMPUTER ENGINEERING
dc.description.sourcetitle2004 4th IEEE Conference on Nanotechnology
dc.description.page65-67
dc.identifier.isiutNOT_IN_WOS
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