Please use this identifier to cite or link to this item: http://scholarbank.nus.edu.sg/handle/10635/70276
Title: Fabrication of embedded media by etching of self-assembled mask
Authors: Verma, L.K. 
Ng, V. 
Keywords: Dry etching
Magnetic nanostructures
Self assembly
Issue Date: 2004
Source: Verma, L.K.,Ng, V. (2004). Fabrication of embedded media by etching of self-assembled mask. 2004 4th IEEE Conference on Nanotechnology : 62-64. ScholarBank@NUS Repository.
Abstract: Argon ion etching assisted by CF4 gas using a mask from self assembly of polystyrene spheres was performed on Si (100) substrates. The etch process is calibrated for the spheres to achieve a good etch rate while maintaining the spherical geometry of the PS spheres during etching. Grooves with vertical side walls and depth of 90 nm were successfully formed. Triangular shaped grooves of mean size 110nm were etched. NiFe was deposited into the groves in Si substrate to form embedded media. Scanning electron microscopy and magnetic force microscopy are used to study the etching profiles and magnetic domain distribution of dots. © 2004 IEEE.
Source Title: 2004 4th IEEE Conference on Nanotechnology
URI: http://scholarbank.nus.edu.sg/handle/10635/70276
ISBN: 0780385365
Appears in Collections:Staff Publications

Show full item record
Files in This Item:
There are no files associated with this item.

Page view(s)

15
checked on Dec 16, 2017

Google ScholarTM

Check


Items in DSpace are protected by copyright, with all rights reserved, unless otherwise indicated.