Please use this identifier to cite or link to this item: https://doi.org/10.1109/CCDC.2012.6243076
Title: Development of in-situ real-time CD monitoring and control system through PEB process
Authors: Yang, G.
Tay, A. 
Ho, W.K. 
Keywords: Critical Dimension
Ellipsometer
Post-Exposure Bake
Real-Time Control
Issue Date: 2012
Source: Yang, G.,Tay, A.,Ho, W.K. (2012). Development of in-situ real-time CD monitoring and control system through PEB process. Proceedings of the 2012 24th Chinese Control and Decision Conference, CCDC 2012 : 3080-3085. ScholarBank@NUS Repository. https://doi.org/10.1109/CCDC.2012.6243076
Abstract: Real-time control is the trend for photoresist processing in the advanced lithography. In this paper we develop an in-situ ellipsometer integrated with a programmable thermal heating system, which could perform real-time monitoring and control for critical dimension (CD) latent image through the entire post-exposure bake (PEB) process. The inline ellipsometry measurements are fitted into an electromagnetic wave model built on the rigorous coupled-wave analysis (RCWA) theory for CD latent image characterization. Thereafter a real-time control scheme is proposed by applying the programmable thermal bake-plate. The experimental outcome demonstrates a significant improvement on the final CD result comparing to the conventional baking method. © 2012 IEEE.
Source Title: Proceedings of the 2012 24th Chinese Control and Decision Conference, CCDC 2012
URI: http://scholarbank.nus.edu.sg/handle/10635/69922
ISBN: 9781457720727
DOI: 10.1109/CCDC.2012.6243076
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