Please use this identifier to cite or link to this item: https://doi.org/10.1109/DAC.2008.4555872
Title: Design-process integration for performance-based OPC framework
Authors: Teh, S.-H.
Heng, C.-H. 
Tay, A. 
Keywords: Circuit performance
Design-process integration
Lithography
Mask design
OPC
Issue Date: 2008
Source: Teh, S.-H.,Heng, C.-H.,Tay, A. (2008). Design-process integration for performance-based OPC framework. Proceedings - Design Automation Conference : 522-527. ScholarBank@NUS Repository. https://doi.org/10.1109/DAC.2008.4555872
Abstract: Along the continued shrinking of critical dimension (CD), the optical proximity correction (OPC) scheme inevitably becomes more aggressive and results in greater mask complexity and cost. Conventional OPC are edge-placement-error (EPE) driven without considering the effect of correction on circuit performance at all. We propose a performance-based OPC (PB-OPC) framework that employs a much simpler mask correction algorithm based on the real-time estimated device performances. When compared to the conventional OPC approach, our PB-OPC achieved 33 to 93% reduction in mask MEBES size and closer circuit performance matching to the design intent. © 2008 ACM.
Source Title: Proceedings - Design Automation Conference
URI: http://scholarbank.nus.edu.sg/handle/10635/69885
ISBN: 9781605581156
ISSN: 0738100X
DOI: 10.1109/DAC.2008.4555872
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