Please use this identifier to cite or link to this item:
|Title:||Design-process integration for performance-based OPC framework|
|Source:||Teh, S.-H.,Heng, C.-H.,Tay, A. (2008). Design-process integration for performance-based OPC framework. Proceedings - Design Automation Conference : 522-527. ScholarBank@NUS Repository. https://doi.org/10.1109/DAC.2008.4555872|
|Abstract:||Along the continued shrinking of critical dimension (CD), the optical proximity correction (OPC) scheme inevitably becomes more aggressive and results in greater mask complexity and cost. Conventional OPC are edge-placement-error (EPE) driven without considering the effect of correction on circuit performance at all. We propose a performance-based OPC (PB-OPC) framework that employs a much simpler mask correction algorithm based on the real-time estimated device performances. When compared to the conventional OPC approach, our PB-OPC achieved 33 to 93% reduction in mask MEBES size and closer circuit performance matching to the design intent. © 2008 ACM.|
|Source Title:||Proceedings - Design Automation Conference|
|Appears in Collections:||Staff Publications|
Show full item record
Files in This Item:
There are no files associated with this item.
checked on Dec 13, 2017
checked on Dec 9, 2017
Items in DSpace are protected by copyright, with all rights reserved, unless otherwise indicated.