Please use this identifier to cite or link to this item: https://doi.org/10.1063/1.355308
Title: Comment on "Steady-state temperature profile for a thin-film resistor under bias" [J. Appl. Phys. 72, 3862 (1992)]
Authors: Lu, Y.-F. 
Issue Date: 1993
Citation: Lu, Y.-F. (1993). Comment on "Steady-state temperature profile for a thin-film resistor under bias" [J. Appl. Phys. 72, 3862 (1992)]. Journal of Applied Physics 74 (8) : 5290-. ScholarBank@NUS Repository. https://doi.org/10.1063/1.355308
Abstract: This comment is to point out that the temperature dependence of the thermal conductivity should be taken into account in computing the temperature distribution in substrate material (such as silicon) with temperature-dependent thermal conductivity. Ignoring the temperature dependence of the thermal conductivity will lead to a large error in the calculated results.
Source Title: Journal of Applied Physics
URI: http://scholarbank.nus.edu.sg/handle/10635/68171
ISSN: 00218979
DOI: 10.1063/1.355308
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