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|Title:||Indicators for photoreactivation and dark repair studies following ultraviolet disinfection|
Low- and medium-pressure ultraviolet disinfection
|Source:||Quek, P.H., Hu, J. (2008-06). Indicators for photoreactivation and dark repair studies following ultraviolet disinfection. Journal of Industrial Microbiology and Biotechnology 35 (6) : 533-541. ScholarBank@NUS Repository. https://doi.org/10.1007/s10295-008-0314-0|
|Abstract:||Repair of DNA in bacteria following ultraviolet (UV) disinfection can cause reactivation of inactivated bacteria and negatively impact the efficiency of the UV disinfection process. In this study, various strains of E. coli (wild-type, UV-resistant and antibiotic-resistant strains) were investigated for their ability to perform dark repair and photoreactivation, and compared based on final repair levels after 4 h of incubation, as well as repair rates. Analysis of the results revealed that the repair abilities of different E. coli strains can differ quite significantly. In photoreactivation, the log repair ranged from 10 to 85%, with slightly lower log repair percentages when medium-pressure (MP) UV disinfection was employed. In dark repair, log repair ranged from 13 to 28% following low-pressure (LP) UV disinfection. E. coli strains ATCC 15597 and ATCC 11229 were found to repair the fastest and to the highest levels for photoreactivation and dark repair, respectively. These strains were also confirmed to repair to higher levels when compared to a pathogenic E. coli O157:H7 strain. Hence, these strains could possibly serve as conservative indicators for future repair studies following UV disinfection. In addition, dimer repair by photoreactivation and dark repair was also confirmed on a molecular level using the endonuclease sensitive site (ESS) assay. © 2008 Society for Industrial Microbiology.|
|Source Title:||Journal of Industrial Microbiology and Biotechnology|
|Appears in Collections:||Staff Publications|
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