Plasma polymerization and deposition of linear, cyclic and aromatic fluorocarbons on (100)-oriented single crystal silicon substrates

Abstract

The deposition of fluoropolymer films by plasma polymerization and deposition of linear, cyclic and aromatic hydrocarbons on the Ar plasma-pretreated Si surfaces under different glow discharge conditions was reported. The x-ray photoelectron spectroscopy, Fourier transform infrared spectroscopy, time-of-flight secondary ion mass spectrometry and water contact angle measurements were used to study the effects of radio-frequency plasma power on the chemical composition and structure of plasma-polymerized fluoropolymer films. The results showed strong bonding between Ar plasma-pretreated Si surfaces and the plasma-polymerized and deposited layers.