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|Title:||Plasma polymerization and deposition of linear, cyclic and aromatic fluorocarbons on (100)-oriented single crystal silicon substrates|
|Citation:||Yang, G.H., Oh, S.W., Kang, E.T., Neoh, K.G. (2002-11). Plasma polymerization and deposition of linear, cyclic and aromatic fluorocarbons on (100)-oriented single crystal silicon substrates. Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films 20 (6) : 1955-1963. ScholarBank@NUS Repository.|
|Abstract:||The deposition of fluoropolymer films by plasma polymerization and deposition of linear, cyclic and aromatic hydrocarbons on the Ar plasma-pretreated Si surfaces under different glow discharge conditions was reported. The x-ray photoelectron spectroscopy, Fourier transform infrared spectroscopy, time-of-flight secondary ion mass spectrometry and water contact angle measurements were used to study the effects of radio-frequency plasma power on the chemical composition and structure of plasma-polymerized fluoropolymer films. The results showed strong bonding between Ar plasma-pretreated Si surfaces and the plasma-polymerized and deposited layers.|
|Source Title:||Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films|
|Appears in Collections:||Staff Publications|
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