Please use this identifier to cite or link to this item: https://doi.org/10.1116/1.1513640
Title: Plasma polymerization and deposition of linear, cyclic and aromatic fluorocarbons on (100)-oriented single crystal silicon substrates
Authors: Yang, G.H.
Oh, S.W.
Kang, E.T. 
Neoh, K.G. 
Issue Date: Nov-2002
Source: Yang, G.H., Oh, S.W., Kang, E.T., Neoh, K.G. (2002-11). Plasma polymerization and deposition of linear, cyclic and aromatic fluorocarbons on (100)-oriented single crystal silicon substrates. Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films 20 (6) : 1955-1963. ScholarBank@NUS Repository. https://doi.org/10.1116/1.1513640
Abstract: The deposition of fluoropolymer films by plasma polymerization and deposition of linear, cyclic and aromatic hydrocarbons on the Ar plasma-pretreated Si surfaces under different glow discharge conditions was reported. The x-ray photoelectron spectroscopy, Fourier transform infrared spectroscopy, time-of-flight secondary ion mass spectrometry and water contact angle measurements were used to study the effects of radio-frequency plasma power on the chemical composition and structure of plasma-polymerized fluoropolymer films. The results showed strong bonding between Ar plasma-pretreated Si surfaces and the plasma-polymerized and deposited layers.
Source Title: Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
URI: http://scholarbank.nus.edu.sg/handle/10635/66752
ISSN: 07342101
DOI: 10.1116/1.1513640
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