Please use this identifier to cite or link to this item:
|Title:||Double-layer inorganic antireflective system for KrF lithography|
|Source:||Xu, M.,Ko, T.-M. (2000-01). Double-layer inorganic antireflective system for KrF lithography. Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures 18 (1) : 127-135. ScholarBank@NUS Repository. https://doi.org/10.1116/1.591163|
|Abstract:||A novel double-layer bottom antireflective method was developed. It contained the advantages of both interference and photoabsorptive types of bottom antireflective coating (BARC) This method could achieve extremely low reflectivity.|
|Source Title:||Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures|
|Appears in Collections:||Staff Publications|
Show full item record
Files in This Item:
There are no files associated with this item.
checked on Dec 12, 2017
checked on Dec 7, 2017
Items in DSpace are protected by copyright, with all rights reserved, unless otherwise indicated.