Please use this identifier to cite or link to this item: https://doi.org/10.1116/1.591163
Title: Double-layer inorganic antireflective system for KrF lithography
Authors: Xu, M.
Ko, T.-M. 
Issue Date: Jan-2000
Source: Xu, M.,Ko, T.-M. (2000-01). Double-layer inorganic antireflective system for KrF lithography. Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures 18 (1) : 127-135. ScholarBank@NUS Repository. https://doi.org/10.1116/1.591163
Abstract: A novel double-layer bottom antireflective method was developed. It contained the advantages of both interference and photoabsorptive types of bottom antireflective coating (BARC) This method could achieve extremely low reflectivity.
Source Title: Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
URI: http://scholarbank.nus.edu.sg/handle/10635/66532
ISSN: 10711023
DOI: 10.1116/1.591163
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