Please use this identifier to cite or link to this item: https://doi.org/10.1039/c0jm02785e
Title: Some recent developments of polyhedral oligomeric silsesquioxane (POSS)-based polymeric materials
Authors: Wang, F.
Lu, X.
He, C. 
Issue Date: 7-Mar-2011
Source: Wang, F., Lu, X., He, C. (2011-03-07). Some recent developments of polyhedral oligomeric silsesquioxane (POSS)-based polymeric materials. Journal of Materials Chemistry 21 (9) : 2775-2782. ScholarBank@NUS Repository. https://doi.org/10.1039/c0jm02785e
Abstract: Polyhedral Oligomeric Silsesquioxane (POSS) has attracted considerable interest in materials science due to its well-defined nano-scale organic-inorganic structure, which makes it an ideal building block for constructing nano-structured hybrid materials and nanocomposites. In this article, we highlight some recent developments in applications of POSS materials: 1) improving thermal and mechanical properties of polymers through incorporation of POSS into polymer matrices to form nanocomposites; 2) using POSS as a building block for design and synthesis of POSS-containing organic semiconductor materials to achieve high photo-luminescence/electron luminescence quantum efficiency in organic light emitting diodes and enhanced performance in electrochromatic devices; 3) exploiting POSS as a hydrophobic unit to develop amphiphilic polymers for drug/gene delivery and formation of hydrogels. A future direction for the development of POSS-containing materials is also proposed for applications in organic photovoltaic and other high-performance materials. © The Royal Society of Chemistry 2011.
Source Title: Journal of Materials Chemistry
URI: http://scholarbank.nus.edu.sg/handle/10635/65003
ISSN: 09599428
DOI: 10.1039/c0jm02785e
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