Please use this identifier to cite or link to this item:
|Title:||Freestanding waveguides in silicon|
|Citation:||Yang, P.Y., Mashanovich, G.Z., Gomez-Morilla, I., Headley, W.R., Reed, G.T., Teo, E.J., Blackwood, D.J., Breese, M.B.H., Bettiol, A.A. (2007). Freestanding waveguides in silicon. Applied Physics Letters 90 (24) : -. ScholarBank@NUS Repository. https://doi.org/10.1063/1.2749175|
|Abstract:||Using a direct-write process for the production of three dimensional microstructures on a semiconductor, freestanding waveguides have been realized in silicon. The waveguides are produced by a focused beam of high energy protons that is scanned over a silicon substrate. The latent image of the scan is subsequently developed by electrochemical etching. Herein the authors report on the fabrication method as well as determining the propagation loss of these structures. Propagation loss values of 13.4 and 14.6 dBcm were obtained for these preliminary structures for transverse electric and transverse magnetic polarizations, respectively. © 2007 American Institute of Physics.|
|Source Title:||Applied Physics Letters|
|Appears in Collections:||Staff Publications|
Show full item record
Files in This Item:
There are no files associated with this item.
checked on Nov 14, 2018
WEB OF SCIENCETM
checked on Nov 6, 2018
checked on Oct 13, 2018
Items in DSpace are protected by copyright, with all rights reserved, unless otherwise indicated.