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|Title:||New approach to nanocomposites of polyimides containing polyhedral oligomeric silsesquioxane for dielectric applications|
|Citation:||Chen, Y., Kang, E.-T. (2004-11). New approach to nanocomposites of polyimides containing polyhedral oligomeric silsesquioxane for dielectric applications. Materials Letters 58 (29) : 3716-3719. ScholarBank@NUS Repository.|
|Abstract:||Low dielectric constant nanocomposites of polyimides with grafted methacrylate side chains containing polyhedral oligomeric silsesquioxane (POSS) were successfully synthesized by thermally initiated free-radical graft copolymerization of methacrylcyclopentyl-POSS (MA-POSS) with the ozone-preactivated poly(amic acid), followed by thermal imidization. The dielectric constant of the film can be tuned by varying the molar ratio of the grafted MA-POSS side chains in the copolymer. © 2004 Elsevier B.V. All rights reserved.|
|Source Title:||Materials Letters|
|Appears in Collections:||Staff Publications|
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