Please use this identifier to cite or link to this item:
|Title:||Distribution of photoresist over GaAs mesa structures|
|Authors:||Ramam, A. |
|Source:||Ramam, A.,Chua, S.J. (1994-02). Distribution of photoresist over GaAs mesa structures. Journal of the Electrochemical Society 141 (2) : 576-578. ScholarBank@NUS Repository.|
|Abstract:||Photoresist distribution and topology over GaAs mesa structures and their dependence on inter-mesa separations are studied and analyzed for different types of resists and spin parameters. The cross-sectional observations give insight into the flow of photoresist over mesa edges and in identifying the difficult region as `mesa edge' for pattern openings. These observations are important where small geometry patterns are required to be opened near to the mesa edge and for interconnecting metal lines running down the mesa. Experimental parameters have been identified for achieving specific GaAs mesa/resist profile combination.|
|Source Title:||Journal of the Electrochemical Society|
|Appears in Collections:||Staff Publications|
Show full item record
Files in This Item:
There are no files associated with this item.
checked on Dec 15, 2017
Items in DSpace are protected by copyright, with all rights reserved, unless otherwise indicated.