Please use this identifier to cite or link to this item: https://doi.org/10.1080/14786430412331332005
Title: Wear debris generation mechanism for polymers studied by nanoscratching
Authors: Mohamed Sani, R.B.
Sinha, S.K. 
Ying Tan, J.P.
Zeng, K.Y.
Issue Date: 1-Jul-2005
Citation: Mohamed Sani, R.B., Sinha, S.K., Ying Tan, J.P., Zeng, K.Y. (2005-07-01). Wear debris generation mechanism for polymers studied by nanoscratching. Philosophical Magazine 85 (19) : 2101-2122. ScholarBank@NUS Repository. https://doi.org/10.1080/14786430412331332005
Abstract: This paper investigates the debris generation mechanism for polymers due to the actions of the micro-asperities of a hard counterface. Nanoscratching tests were conducted on the surface of five commercially available polymers using a diamond conical tip indenter with three different scratching sequences namely unidirectional multipass, orthogonal multipass and orthogonal omnipass. The scratch damage surface was analysed using an atomic force microscope and a scanning electron microscope to investigate the material removal phenomenon for the selected polymers. The results show that debris generation in polymers is largely a phenomenon of low-cycle fatigue when asperities contribute to the localized plastic deformation of the surface. Hence the rate of material removal is reduced for a polymer which has higher toughness and a higher percentage of elongation before failure. The hardness of the polymer has a counter effect on wear as higher hardness tends to reduce the toughness property in polymers which leads to microcracking and further wear debris generation. © 2005 Taylor & Francis Group Ltd.
Source Title: Philosophical Magazine
URI: http://scholarbank.nus.edu.sg/handle/10635/61693
ISSN: 14786435
DOI: 10.1080/14786430412331332005
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