Please use this identifier to cite or link to this item:
|Title:||Wafer level silicon mould fabrication and imprinting of high density microstructures|
High density microstructures
|Source:||Wong, T.I., Ong, H.Y., Lu, H.J., Tse, M.S., Quan, C.G., Ng, S.H., Zhou, X. (2013). Wafer level silicon mould fabrication and imprinting of high density microstructures. Microelectronic Engineering 104 : 64-68. ScholarBank@NUS Repository. https://doi.org/10.1016/j.mee.2012.11.011|
|Abstract:||Wafer level mould fabrication and its imprinting technology are of great interest for cost effective mass fabrication of nano or microsized patterns. Although the process for making a silicon mould involves only several steps such as photolithography, deep reactive ion etching (DRIE) and nanoimprinting, there are still many issues to be overcome in order to achieve uniformly imprinted patterns on the whole wafer. Taking a 4″ wafer full of high density 3 × 3 μm squares with a depth of 10 μm as an example, this paper investigates the pitfalls in silicon mould fabrication and imprinting, and provides feasible solutions as a good reference to researchers seeking to mass fabricate micron-sized patterns by thermal imprinting. © 2012 Elsevier B.V. All rights reserved.|
|Source Title:||Microelectronic Engineering|
|Appears in Collections:||Staff Publications|
Show full item record
Files in This Item:
There are no files associated with this item.
checked on Mar 7, 2018
WEB OF SCIENCETM
checked on Jan 30, 2018
checked on Mar 11, 2018
Items in DSpace are protected by copyright, with all rights reserved, unless otherwise indicated.