Please use this identifier to cite or link to this item: https://doi.org/10.1016/j.optlastec.2003.12.010
Title: Surface roughness investigation of semi-conductor wafers
Authors: Tay, C.J. 
Wang, S.H. 
Quan, C. 
Ng, B.L.
Chan, K.C.
Keywords: Atomic force microscope (AFM)
Light scattering
Non-contact measurement
Surface roughness
Total integrated scattering (TIS)
Issue Date: Oct-2004
Source: Tay, C.J., Wang, S.H., Quan, C., Ng, B.L., Chan, K.C. (2004-10). Surface roughness investigation of semi-conductor wafers. Optics and Laser Technology 36 (7) : 535-539. ScholarBank@NUS Repository. https://doi.org/10.1016/j.optlastec.2003.12.010
Abstract: Conventionally, surface roughness is predominantly determined through the use of stylus instruments. However, there are certain limitations involved in the method, particularly when a test specimen, such as a silicon wafer, has a smooth mirror-like surface. Hence, it is necessary to explore alternative non-contact techniques. Light scattering has recently been gaining popularity as an optical technique to provide prompt and precise inspection of surface roughness. In this paper, the total integrated scattering (TIS) model is modified to retrieve parameters on surface micro-topography through light scattering. The applicability of the proposed modified TIS model is studied and compared with an atomic force microscope. Experimental results obtained show that the proposed technique is highly accurate for measuring surface roughness in the nanometer range. © 2003 Elsevier Ltd. All rights reserved.
Source Title: Optics and Laser Technology
URI: http://scholarbank.nus.edu.sg/handle/10635/61440
ISSN: 00303992
DOI: 10.1016/j.optlastec.2003.12.010
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