Please use this identifier to cite or link to this item: https://doi.org/1/155
Title: Spray coating of photoresist for 3D microstructures with different geometries
Authors: Yu, L. 
Lee, Y.Y.
Tay, F.E.H. 
Iliescu, C.
Keywords: MEMS
Photolithography
Spray Coating
Issue Date: 1-Apr-2006
Source: Yu, L.,Lee, Y.Y.,Tay, F.E.H.,Iliescu, C. (2006-04-01). Spray coating of photoresist for 3D microstructures with different geometries. Journal of Physics: Conference Series 34 (1) : 937-942. ScholarBank@NUS Repository. https://doi.org/1/155
Abstract: This paper presents the advantages of spray coating technique as compared to the conventional spin coating method for photoresist coating of 3D microstructures. An optimized mix of photoresist AZ4620: MEK: PGMEA (1:1.5:0.5) was used to achieve good coverage and uniformity of photoresist not only on planar surface, but also along the trenches' sidewall. In order to achieve the ideal coverage of photoresist layer, the effects of the geometries of the microstructures were also considered. Then, we implement this technique for our application in a MEMS device to prove the viability and potentiality of spray coating of photoresist for fabrication of 3D microstructures. © 2006 IOP Publishing Ltd.
Source Title: Journal of Physics: Conference Series
URI: http://scholarbank.nus.edu.sg/handle/10635/61353
ISSN: 17426588
DOI: 1/155
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