Please use this identifier to cite or link to this item: https://doi.org/10.1016/j.apsusc.2004.10.049
Title: Mesoporous silica thin films prepared by argon plasma treatment of sol-gel-derived precursor
Authors: Zhang, J.
Palaniappan, A. 
Su, X.
Tay, F.E.H. 
Keywords: Argon plasma
Mesoporous
PEG template
Silica
Sol-gel
Issue Date: 30-May-2005
Source: Zhang, J.,Palaniappan, A.,Su, X.,Tay, F.E.H. (2005-05-30). Mesoporous silica thin films prepared by argon plasma treatment of sol-gel-derived precursor. Applied Surface Science 245 (1-4) : 304-309. ScholarBank@NUS Repository. https://doi.org/10.1016/j.apsusc.2004.10.049
Abstract: Argon plasma is used to generate the mesoporous silica thin films from sol-gel-derived precursor. Poly(ethylene glycol) (PEG, MW = 400) is employed as the template, i.e., the pore-directing agent as well as the binder. The influence of the plasma parameters (plasma power and processing time) on the mesoscopic properties of silica films are investigated by scanning electron microscopy (SEM), FT-IR, low-angle X-ray scattering (SAXS), and nitrogen adsorption isotherm. It is concluded that the plasma treatment is a promising way to remove organic templates and generate mesoporous thin films. Compared to the conventional thermal calcination methods, the plasma treatment provides a promising low-temperature, low-cost and time-saving preparation process. © 2004 Elsevier B.V. All rights reserved.
Source Title: Applied Surface Science
URI: http://scholarbank.nus.edu.sg/handle/10635/60727
ISSN: 01694332
DOI: 10.1016/j.apsusc.2004.10.049
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