Please use this identifier to cite or link to this item: https://doi.org/10.1016/j.surfcoat.2004.10.094
Title: Characterization of masking layers for deep wet etching of glass in an improved HF/HCl solution
Authors: Iliescu, C.
Jing, J.
Tay, F.E.H. 
Miao, J.
Sun, T.
Keywords: Masking layers
Surface roughness
Wet etching of glass
Issue Date: 1-Aug-2005
Source: Iliescu, C., Jing, J., Tay, F.E.H., Miao, J., Sun, T. (2005-08-01). Characterization of masking layers for deep wet etching of glass in an improved HF/HCl solution. Surface and Coatings Technology 198 (1-3 SPEC. ISS.) : 314-318. ScholarBank@NUS Repository. https://doi.org/10.1016/j.surfcoat.2004.10.094
Abstract: The paper presents a solution for improving the quality of the surface generated during deep wet etching of glass using an HF (49%)/HCl (37%) solution in a volumetric ratio 10:1. Pyrex glass (Corning 7740) and soda lime glass were analyzed. In addition, the characterization of the main masking layers, including photoresist, amorphous silicon, polysilicon and Cr/Au for deep wet etching in the optimal solution, is described.
Source Title: Surface and Coatings Technology
URI: http://scholarbank.nus.edu.sg/handle/10635/59698
ISSN: 02578972
DOI: 10.1016/j.surfcoat.2004.10.094
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