Please use this identifier to cite or link to this item: https://doi.org/10.1063/1.3651274
Title: Subwavelength lithography by waveguide mode interference
Authors: Wang, B.
Bian Chew, A.
Teng, J.
Si, G.
Danner, A.J. 
Issue Date: 10-Oct-2011
Source: Wang, B., Bian Chew, A., Teng, J., Si, G., Danner, A.J. (2011-10-10). Subwavelength lithography by waveguide mode interference. Applied Physics Letters 99 (15) : -. ScholarBank@NUS Repository. https://doi.org/10.1063/1.3651274
Abstract: A subwavelength lithography method is demonstrated theoretically and experimentally through the interference of transverse electric (TE) modes in a metal-dielectric waveguide (MDW). Like surface plasmon polaritons (SPPs) on metal surfaces, the TE modes have evanescent waves leaking out of the MDW and are used to do subwavelength patterning but with larger pattern area than SPPs for their low propagation loss. The patterning resolution and depth could be optimized by modifying the thickness of the dielectric layer in the MDW. Two-dimensional subwavelength patterning using TE modes is also proposed with azimuthally polarized light exposure. © 2011 American Institute of Physics.
Source Title: Applied Physics Letters
URI: http://scholarbank.nus.edu.sg/handle/10635/57559
ISSN: 00036951
DOI: 10.1063/1.3651274
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