Please use this identifier to cite or link to this item: https://doi.org/10.1007/s00339-004-3093-0
Title: Sub-30 nm lithography with near-field scanning optical microscope combined with femtosecond laser
Authors: Lin, Y. 
Hong, M.H. 
Wang, W.J.
Law, Y.Z.
Chong, T.C. 
Issue Date: Feb-2005
Citation: Lin, Y., Hong, M.H., Wang, W.J., Law, Y.Z., Chong, T.C. (2005-02). Sub-30 nm lithography with near-field scanning optical microscope combined with femtosecond laser. Applied Physics A: Materials Science and Processing 80 (3) : 461-465. ScholarBank@NUS Repository. https://doi.org/10.1007/s00339-004-3093-0
Abstract: We report direct laser writing of lithography patterns with a feature width of 20±5nm on thin photoresist film by combining a double-frequency femtosecond laser and a near-field scanning optical microscope. The obtained feature size is much smaller than the laser wavelength (λ) and the aperture diameter (d) with a resolution of λ/20 and d/2, respectively. The lithography patterns were analyzed with an atomic force microscope and a scanning electron microscope. The effects of laser energy and writing speed on the feature size were investigated. The underlying physical mechanism was also discussed.
Source Title: Applied Physics A: Materials Science and Processing
URI: http://scholarbank.nus.edu.sg/handle/10635/57548
ISSN: 09478396
DOI: 10.1007/s00339-004-3093-0
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