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|Title:||Sub-30 nm lithography with near-field scanning optical microscope combined with femtosecond laser|
|Authors:||Lin, Y. |
|Citation:||Lin, Y., Hong, M.H., Wang, W.J., Law, Y.Z., Chong, T.C. (2005-02). Sub-30 nm lithography with near-field scanning optical microscope combined with femtosecond laser. Applied Physics A: Materials Science and Processing 80 (3) : 461-465. ScholarBank@NUS Repository. https://doi.org/10.1007/s00339-004-3093-0|
|Abstract:||We report direct laser writing of lithography patterns with a feature width of 20±5nm on thin photoresist film by combining a double-frequency femtosecond laser and a near-field scanning optical microscope. The obtained feature size is much smaller than the laser wavelength (λ) and the aperture diameter (d) with a resolution of λ/20 and d/2, respectively. The lithography patterns were analyzed with an atomic force microscope and a scanning electron microscope. The effects of laser energy and writing speed on the feature size were investigated. The underlying physical mechanism was also discussed.|
|Source Title:||Applied Physics A: Materials Science and Processing|
|Appears in Collections:||Staff Publications|
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