Please use this identifier to cite or link to this item: https://doi.org/10.1021/ie900219u
Title: Predictive ratio control for interacting processes
Authors: Tan, K.K. 
Tay, A. 
Shao, Z. 
Huang, S. 
Lee, T.H. 
Issue Date: 2009
Citation: Tan, K.K., Tay, A., Shao, Z., Huang, S., Lee, T.H. (2009). Predictive ratio control for interacting processes. Industrial and Engineering Chemistry Research 48 (23) : 10515-10521. ScholarBank@NUS Repository. https://doi.org/10.1021/ie900219u
Abstract: In this paper, a predictive-PID ratio control scheme is developed for multivariable processes. The Generalized predictive control based PID configuration is incorporated into various conventional ratio control schemes. Conventional parallel and series ratio control cannot satisfy the stringent requirements. The proposed method is applied to the wafer temperature uniformity control in the lithography. Both simulation and experimental results show the effectiveness of the proposed predictive ratio control method. © 2009 American Chemical Society.
Source Title: Industrial and Engineering Chemistry Research
URI: http://scholarbank.nus.edu.sg/handle/10635/57114
ISSN: 08885885
DOI: 10.1021/ie900219u
Appears in Collections:Staff Publications

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