Please use this identifier to cite or link to this item: https://doi.org/10.2961/jlmn.2010.03.0010
Title: Phase shift mask fabrication by laser microlens array lithography for periodic nanostructures patterning
Authors: Huang, Z.
Lin, Q.Y.
Hong, M. 
Keywords: Lithography
Microlens array
Multi-beam
Parallel processing
Periodic structures
Phase shift mask
Issue Date: Dec-2010
Source: Huang, Z., Lin, Q.Y., Hong, M. (2010-12). Phase shift mask fabrication by laser microlens array lithography for periodic nanostructures patterning. Journal of Laser Micro Nanoengineering 5 (3) : 233-237. ScholarBank@NUS Repository. https://doi.org/10.2961/jlmn.2010.03.0010
Abstract: Laser microlens array (MLA) lithography was used to fabricate arbitrary periodic array of patterns on photoresist. Reactive ion etching (RIE) was then utilized to etch and transfer the patterns down to the fused silica substrate. By controlling the etching process, the etched surface was 180° out of phase with the unetched surface. Subsequently, the patterns were used as a phase shift mask for UV exposure. Destructive interference occurred at the edges of the phase shift structures, resulting in regions of low light intensities at the edges. It formed periodic array of smaller patterns on the unexposed photoresist, with feature sizes around 290 nm. Simulation verified the experimental result.
Source Title: Journal of Laser Micro Nanoengineering
URI: http://scholarbank.nus.edu.sg/handle/10635/57048
ISSN: 18800688
DOI: 10.2961/jlmn.2010.03.0010
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