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|Title:||Optimal feed-forward control for multizone baking in microlithography|
|Authors:||Ho, W.K. |
|Citation:||Ho, W.K., Tay, A., Chen, M., Kiew, C.M. (2007-05-23). Optimal feed-forward control for multizone baking in microlithography. Industrial and Engineering Chemistry Research 46 (11) : 3623-3628. ScholarBank@NUS Repository. https://doi.org/10.1021/ie061011p|
|Abstract:||An algorithm for feed-forward control to improve the performance of a multizone baking system used for lithography in semiconductor manufacturing is derived in this paper. It uses linear programming optimization of the heat transfer in a multizone bake plate to produce a predetermined heating sequence. The objective is to minimize the temperature disturbance induced by the placement of a wafer at ambient temperature on the hot multizone bake plate, and the improvement is verified experimentally. © 2007 American Chemical Society.|
|Source Title:||Industrial and Engineering Chemistry Research|
|Appears in Collections:||Staff Publications|
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