Please use this identifier to cite or link to this item:
|Title:||Micromechanical resonators with sub-micron capacitive gaps in 2 μm process|
|Citation:||Shao, L.C., Palaniapan, M., Khine, L., Tan, W.W. (2007). Micromechanical resonators with sub-micron capacitive gaps in 2 μm process. Electronics Letters 43 (25) : 1427-1428. ScholarBank@NUS Repository. https://doi.org/10.1049/el:20072841|
|Abstract:||An innovative gap reduction technique is reported to achieve sub-micron capacitive gaps for micromechanical resonators to boost the output signal using the standard low-cost 2m commercially available foundry process from MEMSCAP. Electrostatic actuation was used to reduce the gap size below the fabrication limitation. To demonstrate the proposed idea, a 6.35MHz Lamé-mode square resonator was designed, fabricated and tested. The resonator gap size was experimentally measured to be 0.64m, which boosted the resonance peak by 20dB. © The Institution of Engineering and Technology 2007.|
|Source Title:||Electronics Letters|
|Appears in Collections:||Staff Publications|
Show full item record
Files in This Item:
There are no files associated with this item.
checked on Nov 10, 2018
WEB OF SCIENCETM
checked on Oct 15, 2018
checked on Oct 6, 2018
Items in DSpace are protected by copyright, with all rights reserved, unless otherwise indicated.