Please use this identifier to cite or link to this item: https://doi.org/10.1049/el:20072841
Title: Micromechanical resonators with sub-micron capacitive gaps in 2 μm process
Authors: Shao, L.C.
Palaniapan, M. 
Khine, L.
Tan, W.W. 
Issue Date: 2007
Source: Shao, L.C.,Palaniapan, M.,Khine, L.,Tan, W.W. (2007). Micromechanical resonators with sub-micron capacitive gaps in 2 μm process. Electronics Letters 43 (25) : 1427-1428. ScholarBank@NUS Repository. https://doi.org/10.1049/el:20072841
Abstract: An innovative gap reduction technique is reported to achieve sub-micron capacitive gaps for micromechanical resonators to boost the output signal using the standard low-cost 2m commercially available foundry process from MEMSCAP. Electrostatic actuation was used to reduce the gap size below the fabrication limitation. To demonstrate the proposed idea, a 6.35MHz Lamé-mode square resonator was designed, fabricated and tested. The resonator gap size was experimentally measured to be 0.64m, which boosted the resonance peak by 20dB. © The Institution of Engineering and Technology 2007.
Source Title: Electronics Letters
URI: http://scholarbank.nus.edu.sg/handle/10635/56623
ISSN: 00135194
DOI: 10.1049/el:20072841
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