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|Title:||Micromechanical resonators with sub-micron capacitive gaps in 2 μm process|
|Citation:||Shao, L.C., Palaniapan, M., Khine, L., Tan, W.W. (2007). Micromechanical resonators with sub-micron capacitive gaps in 2 μm process. Electronics Letters 43 (25) : 1427-1428. ScholarBank@NUS Repository. https://doi.org/10.1049/el:20072841|
|Abstract:||An innovative gap reduction technique is reported to achieve sub-micron capacitive gaps for micromechanical resonators to boost the output signal using the standard low-cost 2m commercially available foundry process from MEMSCAP. Electrostatic actuation was used to reduce the gap size below the fabrication limitation. To demonstrate the proposed idea, a 6.35MHz Lamé-mode square resonator was designed, fabricated and tested. The resonator gap size was experimentally measured to be 0.64m, which boosted the resonance peak by 20dB. © The Institution of Engineering and Technology 2007.|
|Source Title:||Electronics Letters|
|Appears in Collections:||Staff Publications|
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