Please use this identifier to cite or link to this item: https://doi.org/10.1016/j.jallcom.2006.02.112
Title: Large-area parallel near-field optical nanopatterning of functional materials using microsphere mask
Authors: Chen, G.X. 
Hong, M.H. 
Lin, Y. 
Wang, Z.B.
Ng, D.K.T.
Xie, Q.
Tan, L.S. 
Chong, T.C. 
Keywords: Laser processing
Microspheres
Nanopatterning
Near-field effects
Scanning electron microscopy
Issue Date: 31-Jan-2008
Source: Chen, G.X., Hong, M.H., Lin, Y., Wang, Z.B., Ng, D.K.T., Xie, Q., Tan, L.S., Chong, T.C. (2008-01-31). Large-area parallel near-field optical nanopatterning of functional materials using microsphere mask. Journal of Alloys and Compounds 449 (1-2) : 265-268. ScholarBank@NUS Repository. https://doi.org/10.1016/j.jallcom.2006.02.112
Abstract: Large-area parallel near-field optical nanopatterning on functional material surfaces was investigated with KrF excimer laser irradiation. A monolayer of silicon dioxide microspheres was self-assembled on the sample surfaces as the processing mask. Nanoholes and nanospots were obtained on silicon surfaces and thin silver films, respectively. The nanopatterning results were affected by the refractive indices of the surrounding media. Near-field optical enhancement beneath the microspheres is the physical origin of nanostructure formation. Theoretical calculation was performed to study the intensity of optical field distributions under the microspheres according to the light scattering model of a sphere on the substrate. © 2006 Elsevier B.V. All rights reserved.
Source Title: Journal of Alloys and Compounds
URI: http://scholarbank.nus.edu.sg/handle/10635/56456
ISSN: 09258388
DOI: 10.1016/j.jallcom.2006.02.112
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