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|Title:||Large area resist-free soft lithographic patterning of graphene|
Van Gastel, R.
Ten Elshof, J.E.
|Citation:||George, A., Mathew, S., Van Gastel, R., Nijland, M., Gopinadhan, K., Brinks, P., Venkatesan, T., Ten Elshof, J.E. (2013-03-11). Large area resist-free soft lithographic patterning of graphene. Small 9 (5) : 711-715. ScholarBank@NUS Repository. https://doi.org/10.1002/smll.201201889|
|Abstract:||Large area low-cost patterning is a challenging problem in graphene research. A resist-free, single-step, large area and cost effective soft lithographic patterning strategy is presented for graphene. The technique is applicable on any arbitrary substrate that needs to be covered with a graphene film and provides a viable route to large-area patterning of graphene for device applications. Copyright © 2013 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim.|
|Appears in Collections:||Staff Publications|
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