Please use this identifier to cite or link to this item: https://doi.org/10.1002/smll.201201889
Title: Large area resist-free soft lithographic patterning of graphene
Authors: George, A.
Mathew, S. 
Van Gastel, R.
Nijland, M.
Gopinadhan, K. 
Brinks, P.
Venkatesan, T. 
Ten Elshof, J.E.
Keywords: graphene
patterning
plasma etching
resist-free patterning
soft lithography
Issue Date: 11-Mar-2013
Source: George, A.,Mathew, S.,Van Gastel, R.,Nijland, M.,Gopinadhan, K.,Brinks, P.,Venkatesan, T.,Ten Elshof, J.E. (2013-03-11). Large area resist-free soft lithographic patterning of graphene. Small 9 (5) : 711-715. ScholarBank@NUS Repository. https://doi.org/10.1002/smll.201201889
Abstract: Large area low-cost patterning is a challenging problem in graphene research. A resist-free, single-step, large area and cost effective soft lithographic patterning strategy is presented for graphene. The technique is applicable on any arbitrary substrate that needs to be covered with a graphene film and provides a viable route to large-area patterning of graphene for device applications. Copyright © 2013 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim.
Source Title: Small
URI: http://scholarbank.nus.edu.sg/handle/10635/56450
ISSN: 16136810
DOI: 10.1002/smll.201201889
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