Please use this identifier to cite or link to this item: https://doi.org/10.1016/S0304-8853(02)00885-5
Title: Exchange bias in patterned FeMn/NiFe bilayers
Authors: Guo, Z.B
Li, K.B.
Han, G.C. 
Liu, Z.Y.
Luo, P.
Wu, Y.H. 
Keywords: Exchange bias
Hysteresis loops
Lithography
Training effects
Wire-like array
Issue Date: Nov-2002
Source: Guo, Z.B,Li, K.B.,Han, G.C.,Liu, Z.Y.,Luo, P.,Wu, Y.H. (2002-11). Exchange bias in patterned FeMn/NiFe bilayers. Journal of Magnetism and Magnetic Materials 251 (3) : 323-326. ScholarBank@NUS Repository. https://doi.org/10.1016/S0304-8853(02)00885-5
Abstract: Electron beam lithography and ion beam etching have been used to pattern a wire-like array in FeMn/NiFe bilayers. The variation of hysteresis loops with the etching depth in FeMn layer has been presented, and it has been found that with increasing etching depth the coercivity increases and M-H loops show an asymmetric kink. Detailed studies of the magnetic behaviors of the asymmetric kink in the patterned sample with 3.5nm thick FeMn layer have been performed, and a magnetization component perpendicular to the wire direction has been observed. © 2002 Elsevier Science B.V. All rights reserved.
Source Title: Journal of Magnetism and Magnetic Materials
URI: http://scholarbank.nus.edu.sg/handle/10635/55947
ISSN: 03048853
DOI: 10.1016/S0304-8853(02)00885-5
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