Please use this identifier to cite or link to this item:
Title: Evolution of hillocks during silicon etching in TMAH
Authors: Thong, J.T.L. 
Luo, P.
Choi, W.K. 
Tan, S.C.
Issue Date: Jan-2001
Citation: Thong, J.T.L., Luo, P., Choi, W.K., Tan, S.C. (2001-01). Evolution of hillocks during silicon etching in TMAH. Journal of Micromechanics and Microengineering 11 (1) : 61-69. ScholarBank@NUS Repository.
Abstract: The evolution of hillocks on (100)-silicon etched in 4 wt% tetramethyl ammonium hydroxide is studied through a detailed examination of hillock size distribution and individual hillock features using low-voltage scanning electron microscopy. Silicon samples etched for periods of 1.5, 3 and 5 min show that the population of hillocks initially comprises small, square-based pyramids with a wide distribution of aspect ratios ranging up to tall pyramids typifying {111}-bounded pyramids. As etching progresses, the population extends to larger pyramids, the majority of which are somewhat flatter than expected of {111}-bounded pyramids. Detailed examination of individual hillocks suggests that some {111}-bounded pyramids undergo a transformation that eventually leads to a quasi-stable bow-faced hillock configuration. Others collapse from the apex through erosion of the main faces. A number of dissolution routes are observed, and it is postulated that a hillock may undergo a series of fast transformations during its lifetime with intermediate configurations that are quasi-stable.
Source Title: Journal of Micromechanics and Microengineering
ISSN: 09601317
DOI: 10.1088/0960-1317/11/1/310
Appears in Collections:Staff Publications

Show full item record
Files in This Item:
There are no files associated with this item.


checked on Feb 12, 2019


checked on Feb 12, 2019

Page view(s)

checked on Dec 15, 2018

Google ScholarTM



Items in DSpace are protected by copyright, with all rights reserved, unless otherwise indicated.