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|Title:||Direct femtosecond laser nanopatterning of glass substrate by particle-assisted near-field enhancement|
|Citation:||Zhou, Y., Hong, M.H., Fuh, J.Y.H., Lu, L., Luk'Yanchuk, B.S., Wang, Z.B., Shi, L.P., Chong, T.C. (2006). Direct femtosecond laser nanopatterning of glass substrate by particle-assisted near-field enhancement. Applied Physics Letters 88 (2) : 1-3. ScholarBank@NUS Repository. https://doi.org/10.1063/1.2163988|
|Abstract:||Direct femtosecond laser nanopatterning of glass substrate by particle-assisted near-field enhancement was demonstrated in this letter. The nanostructure was characterized by field-emission scanning electron microscopy and atomic force microscopy. No cracks were found on the glass surface. The hole size were measured from 200∼300 nm. When laser fluence is close to the damage threshold, a trihole structure was observed. Nonlinear multiphoton absorption and near-field enhancement were the mechanisms of the nanofeature formation. Calculations based on particle-on-surface theory were carried out. The suggested method has potential applications in the nanolithography of a transparent glass substrate for nanostructure device fabrication. © 2006 American Institute of Physics.|
|Source Title:||Applied Physics Letters|
|Appears in Collections:||Staff Publications|
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