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|Title:||Design and fabrication of optical filters with very large stopband (≈500 nm) and small passband (1 nm) in silicon-on-insulator|
Photonic crystal filter
|Citation:||Jia, W., Deng, J., Reid, B.P.L., Wang, X., Chan, C.C.S., Wu, H., Li, X., Taylor, R.A., Danner, A.J. (2012-10). Design and fabrication of optical filters with very large stopband (≈500 nm) and small passband (1 nm) in silicon-on-insulator. Photonics and Nanostructures - Fundamentals and Applications 10 (4) : 447-451. ScholarBank@NUS Repository. https://doi.org/10.1016/j.photonics.2012.02.001|
|Abstract:||In this paper, we report on the design, fabrication and characterization of a broadband photonic crystal filter. Modeling with a genetic algorithm (GA) was used to investigate the effect of changing the number of periods and thickness ratios of a photonic crystal filter structure with two alternating materials. Theoretical optimized parameters were obtained as a function of wavelength for a photonic crystal filter with a very broad filter bandwidth as well as a very narrow transmission window. We used the determined optimum parameters at a wavelength of 1550 nm to fabricate the structure using e-beam lithography and inductively coupled plasma (ICP) etching. Experimental results show that the structure indeed has a very narrow transmission window and a low loss of just 4 dB. Hence, this structure can be regarded as a high precision filter for optical communication and photonic integrated chip technologies. © 2012 Elsevier B.V. All rights reserved.|
|Source Title:||Photonics and Nanostructures - Fundamentals and Applications|
|Appears in Collections:||Staff Publications|
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