Micro/nanomanufacturing in support of materials science

Abstract

With its LiMiNT facility (Lithography for Micro- and Nanotechnology), Singapore Synchrotron Light Source (SSLS) provides a one-stop shop for micro/nano fabrication on large areas (typically 4" diameter). Synchrotron deep X-ray lithography, eventually enhanced by the super-resolution process, is used to simultaneously pattern large numbers of micro/nano structures into a resist. Laser direct writer or electron beam serve as primary pattern generators, in particular, for mask making. Structure heights of >1mm, aspect ratios of >200, and minimum sizes of <200 nm have been achieved, not necessarily simultaneously. Such structures may be replicated into a variety of metals and plastics. Tilting, rotating of the mask-substrate stack during exposure enables the parallel production of nearly 3D structures. Application fields include electromagnetic metamaterials, X-ray and infrared optics, photonics, lasers, quantum technology, precision manufacturing, and fluidics. SSLS is serving a growing community of users and customers. © 2009 American Institute of Physics.