Please use this identifier to cite or link to this item: https://doi.org/10.1063/1.1632999
Title: Nondestructive microwave permittivity characterization of ferroelectric thin film using microstrip dual resonator
Authors: Tan, C.Y. 
Chen, L. 
Chong, K.B.
Ong, C.K. 
Issue Date: Jan-2004
Citation: Tan, C.Y., Chen, L., Chong, K.B., Ong, C.K. (2004-01). Nondestructive microwave permittivity characterization of ferroelectric thin film using microstrip dual resonator. Review of Scientific Instruments 75 (1) : 136-140. ScholarBank@NUS Repository. https://doi.org/10.1063/1.1632999
Abstract: The use of a microstrip dual resonator for nondestructive permittivity characterization of a ferroelectric thin film at microwave frequencies was described. The temperature dependence of a ferroelectric thin film was also studied using the hermetic test fixture. The dielectric constant and loss tangent of the ferroelectric thin films were derived from the resonant frequencies and quality factors of the dual-resonator structure. It was found that the Curie temperature of the thin film is about 0°C.
Source Title: Review of Scientific Instruments
URI: http://scholarbank.nus.edu.sg/handle/10635/53060
ISSN: 00346748
DOI: 10.1063/1.1632999
Appears in Collections:Staff Publications

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