Please use this identifier to cite or link to this item: https://doi.org/10.1002/smll.200500370
Title: Easy writing of nanopatterns on a polymer film using electrostatic nanolithography
Authors: Jegadesan, S. 
Sindhu, S. 
Valiyaveettil, S. 
Keywords: Atomic force microscopy
Electrostatic interactions
Nanolithography
Polymers
Thin films
Issue Date: Apr-2006
Source: Jegadesan, S., Sindhu, S., Valiyaveettil, S. (2006-04). Easy writing of nanopatterns on a polymer film using electrostatic nanolithography. Small 2 (4) : 481-484. ScholarBank@NUS Repository. https://doi.org/10.1002/smll.200500370
Abstract: The fabrication of poly(methacrylic acid) nanopatterns, with sub-100 nm feature dimensions, on a silicon substrate using a negatively biased atomic force microscopy (AFM) tip was investigated. The kinetics, growth, and optimization of the conditions for nanopatterning using electrostatic nanolithography of the polymer film were studied. It was observed that the features of nanopatterns created from polymer films depend on the type of polymer used and the applied bias and speed of the AFM tip. This method was found to be a highly versatile, direct-write method to produce well-defined nanostructures on a polymer film.
Source Title: Small
URI: http://scholarbank.nus.edu.sg/handle/10635/52883
ISSN: 16136810
DOI: 10.1002/smll.200500370
Appears in Collections:Staff Publications

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