Please use this identifier to cite or link to this item: http://scholarbank.nus.edu.sg/handle/10635/49109
Title: NANO-SCALE MACHINING OF SILICON USING ION IRRADIATION AND ELECTROCHEMICAL ETCHING
Authors: SONG JIAO
Keywords: 3D nanoscale silicon machining, ion irradiation, electrochemical etching, Silicon Nanostencils, Enhanced Photoluminescence, Nanowires formation
Issue Date: 14-Aug-2013
Source: SONG JIAO (2013-08-14). NANO-SCALE MACHINING OF SILICON USING ION IRRADIATION AND ELECTROCHEMICAL ETCHING. ScholarBank@NUS Repository.
Abstract: Nanofabrication techniques play an important role in meeting current demands of highly compact devices with good performance. In this thesis, nano-scale silicon machining using ion irradiation and electrochemical etching are presented and both experimental and fundamental aspects are considered. Our method of nano-scale silicon machining involves simple, direct processes which can fabricate true three-dimensional structures. The fundamental aspects have been explored through simulation, and a variety of experimental parameters of irradiated and electrochemical etching have been studied in great detail, enabling fabrication of various silicon nanostructures, such as, nanowires with diameter of about 50nm, self-aligned, multilayer silicon nanowires, complex free standing silicon nanostructures, etc. These structures can be used in fundamental and applied research areas such as nanostencil lithography. In addition, the phenomena of enhanced photoluminescence from ion irradiated porous silicon and the conditions for producing robust support for three dimensional nanostructures have also been investigated to reveal the physical principles of silicon nano-machining.
URI: http://scholarbank.nus.edu.sg/handle/10635/49109
Appears in Collections:Ph.D Theses (Open)

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