Please use this identifier to cite or link to this item: http://scholarbank.nus.edu.sg/handle/10635/48614
Title: Design for Manufacturing in IC Fabrication: Mask Cost, Circuit Performance and Convergence
Authors: QU YIFAN
Keywords: Semiconductor manufacturing, lithography, circuit performance, mask cost, feedback control, design for manufacturing
Issue Date: 12-Jul-2013
Source: QU YIFAN (2013-07-12). Design for Manufacturing in IC Fabrication: Mask Cost, Circuit Performance and Convergence. ScholarBank@NUS Repository.
Abstract: The lithography process is the most critical step in the fabrication of integrated circuits (IC), accounting over a third of the total manufacturing cost. One of the key issues in the lithography process is the distortion of the printed images due to optical diffraction effect. To eliminate distortion of printed images at these advanced technology nodes, design for manufacturing (DFM) methods, such as optical proximity correction (OPC), have been implemented in the industry. Several problems exists in the current OPC techniques, such as mask cost, electrical performance and convergence issues. This thesis analyzes these problems and proposed a few novel approaches to improve OPC in terms of mask cost, circuit performance, convergence speed and run-time. Simulations are conducted on benchmark circuits to demonstrate the feasibility and effectiveness of these proposed DFM methods.
URI: http://scholarbank.nus.edu.sg/handle/10635/48614
Appears in Collections:Ph.D Theses (Open)

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