Please use this identifier to cite or link to this item: http://scholarbank.nus.edu.sg/handle/10635/43443
Title: Methods for enhancing photolithography patterning
Authors: LING, MOH LUNG
CHUA, GEK SOON
LIN, QUNYING
TAY, CHO JUI 
QUAN, CHENGGEN 
Issue Date: 28-May-2013
Source: LING, MOH LUNG,CHUA, GEK SOON,LIN, QUNYING,TAY, CHO JUI,QUAN, CHENGGEN (2013-05-28). Methods for enhancing photolithography patterning. ScholarBank@NUS Repository.
Abstract: A method for fabricating a semiconductor device that includes: providing a substrate prepared with a photoresist layer; providing a photomask comprising a first and a second pattern having a respective first and second pitch range; providing a composite aperture comprising a first and a second off-axis illumination aperture pattern, the first off-axis aperture pattern having a configuration that improves the process window of the first pitch range and the second off-axis aperture pattern having a configuration that improves the process window for a second pitch range; exposing the photoresist layer on the substrate with radiation from an exposure source through the composite aperture and the photomask; and developing the photoresist layer to pattern the photoresist layer.
URI: http://scholarbank.nus.edu.sg/handle/10635/43443
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