Please use this identifier to cite or link to this item: https://doi.org/10.1117/12.486521
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dc.titleLaser-ablation for MEMS microfabrication on Si and Kapton substrates
dc.contributor.authorLan, B.
dc.contributor.authorHong, M.H.
dc.contributor.authorYe, K.D.
dc.contributor.authorChen, S.X.
dc.contributor.authorChong, T.C.
dc.date.accessioned2013-07-04T08:13:56Z
dc.date.available2013-07-04T08:13:56Z
dc.date.issued2002
dc.identifier.citationLan, B., Hong, M.H., Ye, K.D., Chen, S.X., Chong, T.C. (2002). Laser-ablation for MEMS microfabrication on Si and Kapton substrates. Proceedings of SPIE - The International Society for Optical Engineering 4830 : 196-200. ScholarBank@NUS Repository. https://doi.org/10.1117/12.486521
dc.identifier.issn0277786X
dc.identifier.urihttp://scholarbank.nus.edu.sg/handle/10635/40856
dc.description.abstractLaser-ablation-based microfabrication technology is applied to fabricate micro-electro-mechanical-systems (MEMS) devices on polymer substrates. A micromachining apparatus is designed and developed which includes a 355 nm laser, an uncoated focusing lens, computer-controlled precision x-y-z stages and in-situ process monitoring systems. Concentric rings microstractures are formed by efficiently changing the laser intensity distribution. Tiny via holes and micro-nozzles with different diameters have been obtained by low power laser direct drilling. Optical microscopy and scanning electron microscopy (SEM) are used to evaluate the processing results at different laser processing parameters. This method has the advantages of low-cost and time-saving in circle via holes fabrications. Potential applications of this novel MEMS fabrication technique are also briefed.
dc.description.urihttp://libproxy1.nus.edu.sg/login?url=http://dx.doi.org/10.1117/12.486521
dc.sourceScopus
dc.subjectDiffraction rings
dc.subjectDrilling
dc.subjectKapton
dc.subjectLaser ablation
dc.subjectNozzle
dc.subjectVia hole
dc.typeConference Paper
dc.contributor.departmentCOMPUTER SCIENCE
dc.description.doi10.1117/12.486521
dc.description.sourcetitleProceedings of SPIE - The International Society for Optical Engineering
dc.description.volume4830
dc.description.page196-200
dc.description.codenPSISD
dc.identifier.isiut000181979300035
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