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Title: Positive Photoresist as a Sacrificial Layer for MEMS Micro-component Fabrication with SU-8 Polymer
Keywords: SU-8, Sacrificial layer, MEMS, Microfabrication, Positive photoresist, metallization layer, polymer, lift-off process, surface energy
Issue Date: 13-Aug-2012
Citation: LAU KIA HIAN (2012-08-13). Positive Photoresist as a Sacrificial Layer for MEMS Micro-component Fabrication with SU-8 Polymer. ScholarBank@NUS Repository.
Abstract: SU-8, a type of epoxy polymer, is a new UV-curable material for constructing micromechanical components such as those in micro-electro mechanical systems (MEMS) with high aspect ratios. In addition, compared to other polymers, SU-8 has other capabilities such as photosensitivity and transparency to visible light which make SU-8 compatible with micro-fabrication processes. The important aspect of the current novel method is that the photoresist AZ4620, a polymer, is used as the sacrificial layer instead of a metal layer. AZ4620 can be easily undercut by SU-8 developer and thus reducing the lift-off time considerably. Further, the silicon substrate is metallized with aluminium to reduce the surface energy and drastically shorten the AZ4620 lift-off time. This metal layer is not the sacrificial layer and hence can be reused making the whole process very time-effective and cost-effective with better SU-8 surface qualities.
Appears in Collections:Master's Theses (Open)

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