Please use this identifier to cite or link to this item: http://scholarbank.nus.edu.sg/handle/10635/36364
Title: Positive Photoresist as a Sacrificial Layer for MEMS Micro-component Fabrication with SU-8 Polymer
Authors: LAU KIA HIAN
Keywords: SU-8, Sacrificial layer, MEMS, Microfabrication, Positive photoresist, metallization layer, polymer, lift-off process, surface energy
Issue Date: 13-Aug-2012
Source: LAU KIA HIAN (2012-08-13). Positive Photoresist as a Sacrificial Layer for MEMS Micro-component Fabrication with SU-8 Polymer. ScholarBank@NUS Repository.
Abstract: SU-8, a type of epoxy polymer, is a new UV-curable material for constructing micromechanical components such as those in micro-electro mechanical systems (MEMS) with high aspect ratios. In addition, compared to other polymers, SU-8 has other capabilities such as photosensitivity and transparency to visible light which make SU-8 compatible with micro-fabrication processes. The important aspect of the current novel method is that the photoresist AZ4620, a polymer, is used as the sacrificial layer instead of a metal layer. AZ4620 can be easily undercut by SU-8 developer and thus reducing the lift-off time considerably. Further, the silicon substrate is metallized with aluminium to reduce the surface energy and drastically shorten the AZ4620 lift-off time. This metal layer is not the sacrificial layer and hence can be reused making the whole process very time-effective and cost-effective with better SU-8 surface qualities.
URI: http://scholarbank.nus.edu.sg/handle/10635/36364
Appears in Collections:Master's Theses (Open)

Show full item record
Files in This Item:
File Description SizeFormatAccess SettingsVersion 
lauKH.pdf5.05 MBAdobe PDF

OPEN

NoneView/Download

Page view(s)

295
checked on Dec 1, 2017

Download(s)

561
checked on Dec 1, 2017

Google ScholarTM

Check


Items in DSpace are protected by copyright, with all rights reserved, unless otherwise indicated.